Duoc UC

duoc campus

Description

Duoc UC, with 16 campuses (including Viña del Mar, Valparaíso, and Santiago), is one of Chile’s most highly accredited academic institutions. Known for its design programs, Duoc emphasizes international practices and real-world application. Viña del Mar, located northwest of Santiago, is a coastal city known for its beaches, parks, and modern skyline. Nearby Valparaíso, a historic port city, is famous for its colorful hillside homes and vibrant street art.

Eligible Majors: Fashion Design (Sportswear)

Program Type: Exchange 
“Exchange” lets you study abroad at a partner school while paying FIT tuition, with limited spots available.

Looking to Fund Your Study Abroad Experience?

FIT offers competitive scholarships - up to $10,000 - for students enrolled full-time while abroad. Awards are based on an essay, recommendations, GPA and financial need. Learn more about Paying for Study Abroad.

Review the Duoc UC Financial Budget Sheet (Google Doc) and meet with a financial aid counselor to discuss your program costs. 

Eager to Study Abroad? Apply Now!

Submit your application through the Study Abroad Portal and then complete the required Course Equivalency Form with your Office of International Programs (OIP) program coordinator. After that, your department will review your completed course plan and application. See How to Apply step-by-step.

Apply Now

Program Details

If you have further questions about this program, contact the International Programs office at (212) 217-5380 or [email protected].

Fall: Applications reviewed and approved on a rolling basis through February 15

  • Minimum GPA: 3.0
  • Enrollment: Must be matriculated in a Bachelor's degree program
  • Language Requirement: Students must have the equivalent of one year of college-level Spanish. An intensive course is offered in Santiago before the semester, and additional classes may be available in Viña del Mar based on language level.
  • Capacity: As an exchange program, it operates on a 1:1 ratio—meaning for every FIT student studying abroad, an international student studies at FIT. This limited capacity means spots can be competitive. 

Additional Requirements by Major:

Spatial Experience Design

  • Meet with an academic advisor and/or thoroughly review degree requirements in
  • Degree Works
  • Meet with an OIP program coordinator
  • Obtain approval from the department chair or international coordinator
  • Students study in the School of Design, taking 3rd- and 4th-year Fashion Design courses to fulfill 7th semester major and related area requirements. FIT liberal arts may also be taken online at no cost.
  • Eligible to participate in the 7th semester

A full course load is 40–45 local credits (12 FIT credits), with possible options in Spanish, liberal arts, and minors based on language level. Students with the requisite level of Spanish may find liberal arts course options in Spanish, Social Sciences, Film and Media, or other fields.

A detailed Duoc Academic Calendar can be viewed on the Duoc UC website (typically Semester 2: August - December). Students are generally expected to arrive the weekend before orientation begins.

Students are responsible for making their own accommodation arrangements for the duration of their stay. Both on and off-campus housing is available to students: 

Students will be required to apply for a Student’s Resident Visa / Residente Estudiante Titular for the duration of their stay in Chile. Students are encouraged to carefully review the Student's Resident Visa requirements. Supporting documentation will be provided after approval.

FIT requires all students to be covered in the U.S. and internationally for the duration of their study abroad program. Students are automatically enrolled in the UHC Study Abroad Insurance, which is included in Duoc UC program budget sheet (google doc). This policy is SUNY-mandated, therefore, it cannot be waived. 

The UHC Study Abroad Insurance is ACA compliant and students may waive the FIT Haylor Student Health Insurance using the Study Abroad policy.